The object of this project is thin high-k gate stacks (HfSiO, 70%), which is bind up with MOSFET, while silicon-based integrated circuits have developed rapidly in the past years. High-k dielectric materials are one of the most popular research topics in the micro electronic industry. By using some special properties of some high-k dielectric materials, some new devices may be conducted and the limitation of the thin gate-oxide faced in semiconductor industry may be solved. Electronics based on these improve the life quality and make our life more comfortable, like internet and mobile phones. On the basis of Moore’s law, the number of transistors on the integrated circuits doubled every two years, so that the gate stacks become the concern issue. Scientists and engineers made great efforts to incorporate the high-k dielectric into a transistor. According to SIA [1], in order to maintain the development speed of the semiconductor, researchers should develop constraints like new ...
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